Microelectronic and Integrated Circuit Expert Witness #2454
Expert has expertise and is able to serve as an expert witness in semiconductor IC fabrication, microlithography, LCD and flat panel processing, materials and processes (dielectrics, metals, silicon, and wide band gap semiconductors), photomask design and fabrication, thin films and deposition (PVD and CVD), optical systems, HDD processes, photoresist materials and processing, plasma and dry etching, UV lasers and laser processing, patterned magnetic media, wafer and substrate cleaning, and metrology.
Expert has over 25 years of research, academic, industry, and consulting engineering experience in the fields of microelectronics and integrated circuit fabrication. His research involves semiconductor patterning and microlithography (optical, DUV, electron beam, and EUV), materials and processes (dielectrics, metals, silicon, IR, and wide-band gap materials), thin films and deposition (sputtering, PVD, and CVD), LCDs, UV lasers, photomasks and maskmaking, photoresist materials, etching (plasma, RIE, and wet etch), wafer and substrate processing, HDD processing, and modelling & simulation.
He is a skilled technical consultant and expert witness with experience in intellectual property, patent litigation, patent re-examination, trial testimony (bench and jury), report writing, deposition, and International Trade Commission (ITC) cases.
He has over 100 publications including technical papers, articles, textbooks, and textbook chapters. He holds over 20 patents and has licensed his technology both nationally and internationally